SPIE Advanced Lithography 2017

Страна: США

Город: San Jose, CA

Тезисы до: 06.09.2016

Даты: 26.02.17 — 02.03.17

Адрес: 1000 20th St, Bellingham, WA 98225

Е-мейл Оргкомитета: customerservice@spie.org

Организаторы: SPIE - The international society for optics and photonics

Условия участия и жилье: Information can be found on the conference website


SPIE Advanced Lithography is the premier conference for the lithography community. For over 40 years, SPIE has brought together this community to address challenges presented in fabricating next-generation integrated circuits.

SPIE Advanced Lithography draws more than 2,100 attendees, 55 exhibitors, and 600 technical papers representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.

Featuring presentations on:

 + Extreme Ultraviolet (EUV) Lithography

 + Emerging Patterning Technologies

 + Metrology, Inspection, and Process Control for Microlithography

 + Advances in Patterning Materials and Processes

 + Optical Microlithography

 + Design-Process-Technology Co-optimization for Manufacturability

 + Advanced Etch Technology for Nanopatterning


Exhibition: Advanced Lithography Exhibition, the industry's most important event for lithography R&D, devices, tools, fabrication, and services.

Источник:Customer Service

Веб-сайт конференции: Http://spie.org/SPIE-ADVANCED-LITHOGRAPHY-conference