Hydrophobic nanodispersed silicas with high carbon contentPublished by Astacus on Пт, 01/06/2017 - 16:23
Chuiko Institute of Surface Chemistry of NAS of Ukraine in cooperation with Kalush Experimental Plant developed the technology for production of modified dispersed silicas with high carbon content in the chemisorbed layer.
- High dispersity
- Uniform structure
- Chemical homogeneity
Product can be used for gelation, stabilization of suspensions and emulsions, capsulation of biologically active objects or substances: as filler for polymers, oils, and other organic or organosilicon media: as anti-caking agent for dry mixtures, corn, seeds.
Patent for utility model. No 92772 U Ukraine, МПК CO8G 12/00 CO9D5/00 (2014.01) A method to form grafted modifying layer with high carbon content on the surface of highly dispersed silicas / Iu.M. Bolbukh, R.B. Kozakevych, V.A. Tertykh, I.S. Protsak; Chuiko Institute of Surface Chemistry—applicant and patent owner – No u 201313560, appl. 21.11.2013; publ. 10.09.2014, Bul. No17, 2014
- Specific surface—100-200 m2/g
- Particle size—15-30 nm
- Carbon content—5-9 mas/%
- Moisture content—0.5-0.7 мас/%
- Water wetting angle—130-140 °
Hydrophobic silicas with high carbon content “КМ-412” // Ukrainian specifications ТU U 20.1-03291669-023:2014 / V.A. Tertykh, Iu.M. Bolbukh, R.B. Kozakevych, I.S. Protsak.
Production of hydrophobic highly dispersed silicas:
Under competition conditions an economic growth provides the use of cheap, environmentally friendly technologies. The leading global manufacturers of hydrophobic nanodispersed silicas, such as TORKEN Materials, CABOT, EVONIK Industries, use of polyorganosiloxanes as modifying agent, which provides the chemical homogeneity of surface layer and high content of grafted organic groups.
The product we developed is competitive not only by the basic physicochemical parameters (specific surface, particle size, carbon content), it is distinguished from a number of existing trade marks by the grafted layer structure which could be changed according to the demands upon the material application.
The technology based on a chemical assembling of polysiloxane layer on the surface of nanoparticles under solvent-free conditions.
Developer: Chuiko Institute of Surface Chemistry (CISC) of National Academy of Sciences of Ukraine