SPIE Advanced Lithography
Город: San Jose
Тезисы до: 28.08.2017
Даты: 25.02.18 — 01.03.18
Область наук: Геолого-минералогические;
Е-мейл Оргкомитета: email@example.com
The SPIE Advanced Lithography Symposium has been the showcase of the latest advances in lithography and patterning technology for over four decades. The 2018 symposium will cover the full spectrum of the advances and challenges in state-of-the art lithography technology through several topical conferences. Advances in areas of nano- and micro-patterning for semiconductor IC device application will be presented in sessions devoted to optical lithography, extreme-UV (EUV) lithography, metrology/inspection, patterning materials, etch/deposition technology, and process/technology optimization. As novel patterning and non-IC lithography technologies have become more widely explored, related topics in these areas are also addressed. This year’s symposium is structured into the following seven conferences, each organized by current practitioners of the art working together with organizing committees of experts in these fields. Joint sessions between the conferences also offer opportunities to cover topics common across these interest areas.
2018 SPIE Advanced Lithography Conferences
*Novel Patterning Technologies
*Extreme Ultraviolet Lithography
*Metrology, Inspection, and Process Control for Microlithography
*Advances in Patterning Materials and Processes
*Design-Process-Technology Co-optimization for Manufacturability
*Advanced Etch Technology for Nanopatterning
The Advanced Lithography Symposium continues its role in bringing together the microlithography communities involved with semiconductor devices, micro-/nano-systems, and related fields. Participants come from a broad array of backgrounds to share and learn about state-of-the-art design, tools, materials, metrology, and process integration. Through a series of provocative panel discussions and seminars, the symposium also probes current issues being faced as we extend current methods, move toward alternative approaches, and identify new ways to complement one technology with another. The Symposium also provides the unique and primary forum for meeting and interacting with a wide range of industry experts, researchers, academics, and key players working on patterning technology development. Attendance ensures that participants learn and share the latest developments in areas of central importance to many vital technology fields.
We welcome your participation for the 2018 SPIE Advanced Lithography Symposium and urge you to submit your abstracts to the appropriate conference as described in the individual Calls for Papers, and be sure to encourage your colleagues to do the same. Relevant topics for new technology groups, keynote talks, or panel discussions are also solicited.
Веб-сайт конференции: http://spie.org/conferences-and-exhibitions/advanced-lithography/invitation