41st International Symposium on Dry Process (DPS2019)

Е-мейл Оргкомитета: dps2019[at]officepolaris.co.jp

Организаторы: Toshiba Memory Corporation, Hiroshima University, Osaka City University

The 41st International Symposium on Dry Process (DPS2019) will be held at JMS Aster Plaza, Hiroshima in Japan, from November 21 to 22, 2019. The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than three decades.

 Theme
    Dry processes and related technologies from fundamentals to applications

Topics
    Etching Technologies
    Manufacturing Technologies (AEC, APC, EES, FDC)
    Surface Reaction and Damage
    Plasma Diagnostics and Monitoring Systems
    Modeling and Simulation
    Plasma Generation (Equipment/Source)
    Deposition Technologies (CVD / PVD)
    Atomic Layer Processes (ALD/ALE)
    Plasma Processes for 3D Device, FPD, Photovoltaic Devices
    Plasma Processes for New Material Devices (MRAM, Power, Organic)
    Plasma Processes for Biological and Medical application, MEMS
    Atmospheric Pressure Plasma and Liquid Plasma
    New Dry Process Concepts

Веб-сайт конференции: http://www.dry-process.org/2019/index.html