41st International Symposium on Dry Process (DPS2019)
Страна: Япония
Город: Hiroshima
Тезисы до: 19.07.2019
Даты: 21.11.19 — 22.11.19
Область наук: Физико-математические;
Е-мейл Оргкомитета: dps2019[at]officepolaris.co.jp
Организаторы: Toshiba Memory Corporation, Hiroshima University, Osaka City University
The 41st International Symposium on Dry Process (DPS2019) will be held at JMS Aster Plaza, Hiroshima in Japan, from November 21 to 22, 2019. The Symposium covers all aspects of the rapidly evolving fields of dry processes, including but not limited to plasma etching and deposition processes, diagnostics and modeling of plasmas and surfaces, and surface modifications by plasmas, for the applications in, e.g., microelectronics, power devices, sensors, environmental protection, biological systems, and medicine. The DPS has provided valuable forums for in-depth discussion among professionals and students working in this exciting field for more than three decades.
Theme
Dry processes and related technologies from fundamentals to applications
Topics
Etching Technologies
Manufacturing Technologies (AEC, APC, EES, FDC)
Surface Reaction and Damage
Plasma Diagnostics and Monitoring Systems
Modeling and Simulation
Plasma Generation (Equipment/Source)
Deposition Technologies (CVD / PVD)
Atomic Layer Processes (ALD/ALE)
Plasma Processes for 3D Device, FPD, Photovoltaic Devices
Plasma Processes for New Material Devices (MRAM, Power, Organic)
Plasma Processes for Biological and Medical application, MEMS
Atmospheric Pressure Plasma and Liquid Plasma
New Dry Process Concepts
Веб-сайт конференции: http://www.dry-process.org/2019/index.html