SPIE Advanced Lithography 2016

Країна: США

Місто: San Jose

Тези до: 08.09.2015

Дати: 21.02.16 — 25.02.16

Область наук: Геолого-мінералогічні;

Е-мейл Оргкомітету: customerservice@spie.org

Організатори: SPIE

 

For over 40 years, SPIE has brought together this community to address challenges presented in fabricating next-generation integrated circuits.
SPIE Advanced Lithography draws more than 2,300 attendees, 50 exhibitors, and 600 technical papers representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.

Featuring presentations on:
+ Extreme Ultraviolet (EUV) Lithography
+ Alternative Lithographic Technologies
+ Metrology, Inspection, and Process Control for Microlithography
+ Advances in Patterning Materials and Processes
+ Optical Microlithography
+ Design-Process-Technology Co-optimization for Manufacturability
+ Advanced Etch Technology for Nanopatterning

Веб-сторінка конференції: http://www.rsc.org/events/detail/19086/spie-advanced-lithography-2016