SPIE Advanced Lithography 2017

Країна: США

Місто: San Jose, CA

Тези до: 06.09.2016

Дати: 26.02.17 — 02.03.17

Address: 1000 20th St, Bellingham, WA 98225

Е-мейл Оргкомітету: customerservice@spie.org

Організатори: SPIE - The international society for optics and photonics

Умови участі та проживання: Information can be found on the conference website

 

SPIE Advanced Lithography is the premier conference for the lithography community. For over 40 years, SPIE has brought together this community to address challenges presented in fabricating next-generation integrated circuits.

SPIE Advanced Lithography draws more than 2,100 attendees, 55 exhibitors, and 600 technical papers representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.

Featuring presentations on:

 + Extreme Ultraviolet (EUV) Lithography

 + Emerging Patterning Technologies

 + Metrology, Inspection, and Process Control for Microlithography

 + Advances in Patterning Materials and Processes

 + Optical Microlithography

 + Design-Process-Technology Co-optimization for Manufacturability

 + Advanced Etch Technology for Nanopatterning

 

Exhibition: Advanced Lithography Exhibition, the industry's most important event for lithography R&D, devices, tools, fabrication, and services.

Джерело:Customer Service

Веб-сторінка конференції: Http://spie.org/SPIE-ADVANCED-LITHOGRAPHY-conference

 

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